DIFFER
DIFFER Publication
Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2006
|
| Journal |
Thin Solid Films
|
| Volume |
510
|
| Number |
1-2
|
| Number of Pages |
26-31
|
| Date Published |
07/2006
|
| ISBN Number |
0040-6090
|
| Accession Number |
ISI:000238011200005
|
| URL | |
| PId |
9fc2c4666aca21be4306ef1bdc4a32cf
|
Journal Article
|
|
| Download citation |
Citation
Alink, L., van de Kruijs, R. W., Louis, E., Bijkerk, F., & Verhoeven, J. (2006). Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films, 510, 26-31. Retrieved from <Go to ISI>://000238011200005 (Original work published 2006)