DIFFER

E. Louis

First name
E.
Last name
Louis
Zoethout, E. ., Louis, E. ., & Bijkerk, F. . (2016). In depth study of molybdenum silicon compound formation at buried interfaces. Journal of Applied Physics, 120(11), 115303. https://doi.org/10.1063/1.4962541
Huang, Q. ., de Boer, M. ., Barreaux, J. ., van der Meer, R. ., Louis, E. ., & Bijkerk, F. . (2014). High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths. Optics Express, 22(16), 19365-19374. https://doi.org/10.1364/OE.22.019365 (Original work published 2024)
Yakunin, S. N., Makhotkin, I. A., van de Kruijs, R. W. E., Chuev, M. A., Pashaev, E. ., Zoethout, E. ., … Kovalchuk, M. V. (2014). Model independent X-ray standing wave analysis of periodic multilayer structures. Journal of Applied Physics, 115(13), 134303. https://doi.org/10.1063/1.4869540 (Original work published)
Medvedev, V. V., van den Boogaard, A. J. R., van der Meer, R. ., Yakshin, A. E., Louis, E. ., Krivtsun, V. M., & Bijkerk, F. . (2013). Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors. Optics Express, 21, 16964-16974. https://doi.org/10.1364/oe.21.016964 (Original work published 2024)
Sobierajski, R. ., Loch, R. A., van de Kruijs, R. W. E., Louis, E. ., von Blanckenhagen, G. ., Gullikson, E. M., … Bijkerk, F. . (2013). Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources. Journal of Synchrotron Radiation, 20, 249-257. https://doi.org/10.1107/s0909049512049990 (Original work published 2024)
Medvedev, V. V., van de Kruijs, R. W. E., Yakshin, A. E., Novikova, N. N., Krivtsun, V. M., Louis, E. ., … Bijkerk, F. . (2013). Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography. Applied Physics Letters, 103, 221114. https://doi.org/10.1063/1.4837335
Makhotkin, I. A., Zoethout, E. ., van de Kruijs, R. ., Yakunin, S. N., Louis, E. ., Yakunin, A. M., … Bijkerk, F. . (2013). Short period La/B and LaN/B multilayer mirrors for similar to 6.8 nm wavelength. Optics Express, 21, 29894-29904. https://doi.org/10.1364/oe.21.029894 (Original work published 2024)
Zoethout, E. ., Louis, E. ., & Bijkerk, F. . (2013). Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films. Applied Surface Science, 285, Part B, 293-299. https://doi.org/http://dx.doi.org/10.1016/j.apsusc.2013.08.053
Loch, R. A., Sobierajski, R. ., Louis, E. ., Bosgra, J. ., & Bijkerk, F. . (2012). Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Opt. Express, 20, 28200–28215. https://doi.org/10.1364/OE.20.028200 (Original work published 2024)
Liu, F. ., Lee, C. J., Chen, J. Q., Louis, E. ., van der Slot, P. J. M., Boller, K. J., & Bijkerk, F. . (2012). Ellipsometry with randomly varying polarization states. Optics Express, 20(2), 870-878. https://doi.org/10.1364/OE.20.000870 (Original work published 2024)