J. Verhoeven

Bosgra, J. ., Veldhuizen, L. W., Zoethout, E. ., Verhoeven, J. ., Loch, R. A., Yakshin, A. E., & Bijkerk, F. . (2013). Interactions of C in layered Mo-Si structures. Thin Solid Films, 542, 210-213. https://doi.org/10.1016/j.tsf.2013.06.082

Bosgra, J. ., Verhoeven, J. ., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. . (2012). Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin Solid Films, 522, 228–232. https://doi.org/10.1016/j.tsf.2012.08.051

Bosgra, J. ., Zoethout, E. ., van der Eerden, A. M. J., Verhoeven, J. ., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. . (2012). Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors. Applied Optics, 51, 8541-8548. https://doi.org/10.1364/AO.51.008541 (Original work published)

de Rooij-Lohmann, V. ., Yakshin, A. E., Zoethout, E. ., Verhoeven, J. ., & Bijkerk, F. . (2011). Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection. Applied Surface Science, 257(14), 6251-6255. https://doi.org/10.1016/j.apsusc.2011.02.054 (Original work published 2024)

Chen, J. Q., Louis, E. ., Verhoeven, J. ., Harmsen, R. ., Lee, C. J., Lubomska, M. ., … Bijkerk, F. . (2010). Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257, 354-361. Retrieved from <Go to ISI>://000281674200003 (Original work published 2024)

Dobrovolskiy, S. ., Yakshin, A. E., Tichelaar, F. D., Verhoeven, J. ., Louis, E. ., & Bijkerk, F. . (2010). Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms, 268, 560-567. Retrieved from <Go to ISI>://000276053700004 (Original work published 2024)

Kessels, M. J. H., Verhoeven, J. ., Tichelaar, F. D., & Bijkerk, F. . (2006). Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors. Surface Science, 600, 1405-1408. Retrieved from <Go to ISI>://000236455100029 (Original work published 2024)

Alink, L. ., de Kruijs, R. ., Louis, E. ., Bijkerk, F. ., & Verhoeven, J. . (2006). Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films, 510, 26-31. Retrieved from <Go to ISI>://000238011200005 (Original work published 2024)

Dobrovolskiy, S. ., Yakshin, A. E., Kessels, M. J. H., & Verhoeven, J. . (2005). The application of energetic CHx+ ions to form a Si/SiC multilayer system for reflection of radiation between 20 and 80 nm. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms, 237, 533-542. Retrieved from <Go to ISI>://000231777800006 (Original work published 2024)

Kessels, M. J. H., Bijkerk, F. ., Tichelaar, F. D., & Verhoeven, J. . (2005). Determination of in-depth density profiles of multilayer structures. Journal of Applied Physics, 97. Retrieved from <Go to ISI>://000229155600023 (Original work published 2024)