J. Verhoeven

Kessels, M. J. H., Verhoeven, J., Tichelaar, F. D., & Bijkerk, F. (2005). Ion-induced interface layer formation in W/Si and WRe/Si multilayers. Surface Science, 582, 227-234. Retrieved from <Go to ISI>://000229341500025 (Original work published 2005)

Kessels, M. J. H., Verhoeven, J., Yakshin, A. E., Tichelaar, F. D., & Bijkerk, F. (2004). Ion beam induced intermixing of interface structures in W/Si multilayers. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms, 222, 484-490. Retrieved from <Go to ISI>://000223121800016 (Original work published 2004)

Schlatmann, R., Lu, C., Verhoeven, J., Puik, E. J., & van der Wiel, M. J. (1994). Modification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers. Applied Surface Science, 78, 147-157. https://doi.org/10.1016/0169-4332(94)00108-1 (Original work published 1994)

Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 1994)

Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 1993)

Schlatmann, R., Keppel, A., Xue, Y., Verhoeven, J., & van der Wiel, M. J. (1993). Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density. Applied Physics Letters, 63, 3297-3299. https://doi.org/10.1063/1.110179 (Original work published 1993)

Puik, E. J., van der Wiel, M. J., Zeijlemaker, H., & Verhoeven, J. (1992). Ion-Bombardment of Thin-Layers - the Effect on the Interface Roughness and Its X-Ray Reflectivity. Review of Scientific Instruments, 63, 1415-1419. https://doi.org/10.1063/1.1143031 (Original work published 1992)

Puik, F. J., van der Wiel, M. J., Zeijlemaker, H., & Verhoeven, J. (1991). Ion Etching of Thin W-Layers - Enhanced Reflectivity of W-C Multilayer Coatings. Applied Surface Science, 47, 63-76. (Original work published 1991)

Puik, E. J., van der Wiel, M. J., Zeijlemaker, H., & Verhoeven, J. (1991). Ion-Bombardment of X-Ray Multilayer Coatings - Comparison of Ion Etching and Ion Assisted Deposition. Applied Surface Science, 47, 251-260. https://doi.org/10.1016/0169-4332(91)90039-m (Original work published 1991)

Puik, E. J., van Dorssen, G. E., van der Wiel, M. J., Verhoeven, J., Vanderlaan, G., & Padmore, H. A. (1991). Characterization of the Resolving Power of a Double Multilayer Monochromator in the Energy-Range of 600-900 Ev. Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 9, 3142-3148. https://doi.org/10.1116/1.577185 (Original work published 1991)