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Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment

Label Value
Author
E. Louis
H. J. Voorma
N. B. Koster
L. Shmaenok
F. Bijkerk
R. Schlatmann
J. Verhoeven
Y. Y. Platonov
G. E. van Dorssen
H. A. Padmore
Abstract

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.
Year of Publication
1994
Journal
Microelectronic Engineering
Volume
23
Number
1-4
Number of Pages
215-218
Date Published
01/1994
ISBN Number
0167-9317
DOI
10.1016/0167-9317(94)90140-6
PId
7b9d82cb984e22597b6c456e0f52cb51
Journal Article
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Citation
Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 1994)