R. Schlatmann

Schlatmann, R., Lu, C., Verhoeven, J., Puik, E. J., & van der Wiel, M. J. (1994). Modification by Ar and Kr Ion-Bombardment of Mo/Si X-Ray Multilayers. Applied Surface Science, 78, 147-157. https://doi.org/10.1016/0169-4332(94)00108-1 (Original work published 2025)

Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 2025)

Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 2025)

Schlatmann, R., Keppel, A., Xue, Y., Verhoeven, J., & van der Wiel, M. J. (1993). Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density. Applied Physics Letters, 63, 3297-3299. https://doi.org/10.1063/1.110179 (Original work published)