H. J. Voorma

Voorma, H. J., Louis, E., Koster, N. B., & Bijkerk, F. (1998). Temperature induced diffusion in Mo/Si multilayer mirrors. Journal of Applied Physics, 83, 4700-4708. https://doi.org/10.1063/1.367258 (Original work published 1998)

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., & Spiller, E. (1997). Characterization of multilayers by Fourier analysis of x-ray reflectivity. Journal of Applied Physics, 81, 6112-6119. https://doi.org/10.1063/1.364360 (Original work published 1997)

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., Zijlstra, T., de Groot, L. E. M., … Friedrich, J. (1997). Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science & Technology B, 15, 293-298. https://doi.org/10.1116/1.589309 (Original work published 1997)

Voorma, H. J., Louis, E., Bijkerk, F., & Abdali, S. (1997). Angular and energy dependence of ion bombardment of Mo/Si multilayers. Journal of Applied Physics, 82, 1876-1881. https://doi.org/10.1063/1.365992 (Original work published 1997)

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 1996)

Voorma, H. J., van Dorssen, G. E., Louis, E., Koster, N. B., Smith, A. D., Roper, M. D., & Bijkerk, F. (1996). EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature. Applied Surface Science, 93, 221-230. https://doi.org/10.1016/0169-4332(95)00347-9 (Original work published 1996)

Louis, E., Voorma, H. J., Koster, N. B., Bijkerk, F., Platonov, Y. Y., Zuev, S. Y., … Salashchenko, N. N. (1995). Multilayer Coated Reflective Optics for Extreme Uv Lithography. Microelectronic Engineering, 27, 235-238. https://doi.org/10.1016/0167-9317(94)00096-d (Original work published 1995)

Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 1994)

Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 1993)

Voorma, H. J., & Bijkerk, F. (1992). Design of an Extended Image Field Soft-X-Ray Projection System. Microelectronic Engineering, 17, 145-148. https://doi.org/10.1016/0167-9317(92)90029-q (Original work published 1992)