Y . Y. Platonov

Bijkerk, F. ., Shmaenok, L. A., Louis, E. ., Voorma, H. J., Koster, N. B., Bruineman, C. ., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 2025)

Louis, E. ., Voorma, H. J., Koster, N. B., Bijkerk, F. ., . Y. Platonov, Y. ., . Y. Zuev, S. ., … Salashchenko, N. N. (1995). Multilayer Coated Reflective Optics for Extreme Uv Lithography. Microelectronic Engineering, 27, 235-238. https://doi.org/10.1016/0167-9317(94)00096-d (Original work published 2025)

Louis, E. ., Voorma, H. J., Koster, N. B., Shmaenok, L. ., Bijkerk, F. ., Schlatmann, R. ., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 2025)

Bijkerk, F. ., Shmaenok, L. ., Vanhonk, A. ., Bastiaensen, R. ., . Y. Platonov, Y. ., Shevelko, A. P., … Nikolaus, B. . (1994). Laser-Plasma Sources for Soft-X-Ray Projection Lithography. Journal De Physique Iii, 4, 1669-1677. https://doi.org/10.1051/jp3:1994232 (Original work published 2025)