F. J. Gou

Zhao, C. L., . Y. Deng, C. ., Sun, W. Z., Zhang, J. Y. ., Chen, F. ., He, P. N., … Gou, F. J. (2012). Etching Mechanisms of CF3 Etching Fluorinated Si: Molecular Dynamics Simulation. Plasma Science & Technology, 14(7), 670-674. https://doi.org/10.1088/1009-0630/14/7/23 (Original work published 2024)

He, P. N., Ning, J. P., Qin, Y. M., Zhao, C. L., & Gou, F. J. (2011). Molecular dynamics simulations of low-energy Cl atoms etching Si(100) surface. Acta Physica Sinica, 60, 045209. https://doi.org/10.7498/aps.60.045209 (Original work published 2024)

He, P. N., Lu, X. D., Zhao, C. L., Ning, J. P., Qing, Y. M., & Gou, F. J. (2011). Molecular dynamics simulations of energy effects on atorn F interaction with SiC(100). Acta Physica Sinica, 60(9), 095203. https://doi.org/10.7498/aps.60.095203 (Original work published 2024)

Ning, J. P., Lu, X. D., Zhao, C. L., Qin, Y. M., He, P. N., Bogaerts, A. ., & Gou, F. J. (2010). Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface. Acta Physica Sinica, 59, 7225-7231. Retrieved from <Go to ISI>://000283406400078 (Original work published 2024)

Gou, F. J., Xu, M. ., Sun, W. L., & Chen, T. . (2007). Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation. Journal of Non-Crystalline Solids, 353, 4186-4190. Retrieved from <Go to ISI>://000250971900025 (Original work published 2024)