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Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation

Label Value
Author
Year of Publication
2007
Journal
Journal of Non-Crystalline Solids
Volume
353
Number
44-46
Number of Pages
4186-4190
Date Published
11/2007
ISBN Number
0022-3093
Accession Number
ISI:000250971900025
URL
PId
925db504d00f52f6061184ee53bb60f4
Journal Article
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Citation
Gou, F. J., Xu, M., Sun, W. L., & Chen, T. (2007). Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation. Journal of Non-Crystalline Solids, 353, 4186-4190. Retrieved from <Go to ISI>://000250971900025 (Original work published 2007)