H. Wormeester

Chen, J. Q., Louis, E., Wormeester, H., Harmsen, R., van de Kruijs, R., Lee, C. J., … Bijkerk, F. (2011). Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology, 22(10), 105705. https://doi.org/10.1088/0957-0233/22/10/105705 (Original work published 2025)

Chen, J. Q., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., … Bijkerk, F. (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published 2025)

Chen, J. Q., Louis, E., Lee, C. J., Wormeester, H., Kunze, R., Schmidt, H., … Bijkerk, F. (2009). Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express, 17, 16969-16979. Retrieved from <Go to ISI>://000269736100067 (Original work published 2025)