H. Wormeester

Chen, J. Q., Louis, E. ., Wormeester, H. ., Harmsen, R. ., van de Kruijs, R. ., Lee, C. J., … Bijkerk, F. . (2011). Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology, 22(10), 105705. https://doi.org/10.1088/0957-0233/22/10/105705 (Original work published 2025)

Chen, J. Q., Louis, E. ., Harmsen, R. ., Tsarfati, T. ., Wormeester, H. ., van Kampen, M. ., … Bijkerk, F. . (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published 2025)

Chen, J. Q., Louis, E. ., Lee, C. J., Wormeester, H. ., Kunze, R. ., Schmidt, H. ., … Bijkerk, F. . (2009). Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express, 17, 16969-16979. Retrieved from <Go to ISI>://000269736100067 (Original work published 2025)