DIFFER

M. van Kampen

First name
M.
Last name
van Kampen
Wang, S. C., van Kampen, M., & Morgan, T. W. (2023). Promotion of plasma-induced deuterium uptake of ruthenium films by monolayer-thick tin layers. Acs Applied Materials And Interfaces, 15(49), 57769–57782. https://doi.org/10.1021/acsami.3c11245 (Original work published 2023)
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Wang, S. C., van der Horst, R. M., van Kampen, M., & Morgan, T. W. (2022). Application of a dual-thermopile radical probe to expanding hydrogen plasmas. Plasma Sources Science And Technology, 31(8), 085011. https://doi.org/10.1088/1361-6595/ac71c3
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Wang, S., Zoethout, E., van Kampen, M., & Morgan, T. W. (2022). Surface-limited deuterium uptake of Ru films under plasma exposure. Journal Of Applied Physics, 132(22), 225903. https://doi.org/10.1063/5.0126412 (Original work published 2023)
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Chen, J. Q., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., et al. (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published Oct)
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Chen, J. Q., Louis, E., Verhoeven, J., Harmsen, R., Lee, C. J., Lubomska, M., et al. (2010). Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257, 354-361. Retrieved de ://000281674200003 (Original work published Nov)
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