M. van Kampen

First name
Last name
van Kampen
Wang, S. C., van Kampen, M., & Morgan, T. W. (2023). Promotion of plasma-induced deuterium uptake of ruthenium films by monolayer-thick tin layers. Acs Applied Materials And Interfaces, 15(49), 57769–57782. https://doi.org/10.1021/acsami.3c11245 (Original work published 2023)
Wang, S. C., van der Horst, R. M., van Kampen, M., & Morgan, T. W. (2022). Application of a dual-thermopile radical probe to expanding hydrogen plasmas. Plasma Sources Science And Technology, 31(8), 085011. https://doi.org/10.1088/1361-6595/ac71c3
Wang, S., Zoethout, E., van Kampen, M., & Morgan, T. W. (2022). Surface-limited deuterium uptake of Ru films under plasma exposure. Journal Of Applied Physics, 132(22), 225903. https://doi.org/10.1063/5.0126412 (Original work published 2023)
Chen, J. Q., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., et al. (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published Oct)
Chen, J. Q., Louis, E., Verhoeven, J., Harmsen, R., Lee, C. J., Lubomska, M., et al. (2010). Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257, 354-361. Retrieved de ://000281674200003 (Original work published Nov)