M. van Kampen

Wang, S. ., van Kampen, M. ., & Morgan, T. W. (2023). Promotion of plasma-induced deuterium uptake of ruthenium films by monolayer-thick tin layers. ACS Applied Materials and Interfaces, 15(49), 57769–57782. https://doi.org/10.1021/acsami.3c11245 (Original work published 2023)

Wang, S. ., van der Horst, R. ., van Kampen, M. ., & Morgan, T. W. (2022). Application of a dual-thermopile radical probe to expanding hydrogen plasmas. Plasma Sources Science and Technology, 31(8), 085011. https://doi.org/10.1088/1361-6595/ac71c3

Wang, S. ., Zoethout, E. ., van Kampen, M. ., & Morgan, T. W. (2022). Surface-limited deuterium uptake of Ru films under plasma exposure. Journal of Applied Physics, 132(22), 225903. https://doi.org/10.1063/5.0126412 (Original work published 2023)

Chen, J. Q., Louis, E. ., Harmsen, R. ., Tsarfati, T. ., Wormeester, H. ., van Kampen, M. ., … Bijkerk, F. . (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published 2024)

Chen, J. Q., Louis, E. ., Verhoeven, J. ., Harmsen, R. ., Lee, C. J., Lubomska, M. ., … Bijkerk, F. . (2010). Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257, 354-361. Retrieved from <Go to ISI>://000281674200003 (Original work published 2024)