Application of a dual-thermopile radical probe to expanding hydrogen plasmas

We compare the performance of a hydrogen radical probe to historic data determined via Two-Photon Absorption Laser Induced Fluorescence (TALIF) using a comparable cascaded arc source under similar operating conditions. This probe has dual heat flux sensors (DHFS) each coated with materials with different catalytic properties for hydrogen atoms. In the ideal situation, the hydrogen radical flux can be deduced based on the difference between the heat loads measured by these two sensors. The influence of DHFS temperature on the performance was also assessed. The experimental results showed measurement errors of <10% could be obtained regardless of the probe temperature during plasma exposures. To convert heat fluxes into atomic fluxes, we calibrated the difference of the recombination coefficients using a vacuum ultraviolet (VUV) absorption technique, which is more reliable than modeled values based on assumptions or scattered values reported in literature. As a result, we measured the hydrogen plasma and radical parameters at various settings using both a double Langmuir probe and the DHFS. The typical atom flux in the 1022 m-2s-1 range was in good agreement with those obtained using optical techniques. We also observed that the ion and atom fluxes are both sensitive to the background gas pressure. These findings validate application of the DHFS to the cascaded arc source, and could pave the way for optimization of the source performance in the plasma material processing experiments.