W. M. M. Kessels

Perrotta, A., Aresta, G., van Beekum, E. R. J., Palmans, J., van de Weijer, P., van de Sanden, M. C. M., … Creatore, M. (2015). The impact of the nano-pore filling on the performance of organosilicon-based moisture barriers. Thin Solid Films, 595, Part B, 251-257. https://doi.org/10.1016/j.tsf.2015.05.026 (Original work published 2015)

Perrotta, A., van Beekum, E. R. J., Aresta, G., Jagia, A., Keuning, W., van de Sanden, M. C. M., … Creatore, M. (2014). On the role of nanoporosity in controlling the performance of moisture permeation barrier layers. Microporous and Mesoporous Materials, 188, 163-171. https://doi.org/10.1016/j.micromeso.2014.01.013

Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2013). Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth. Journal of Vacuum Science & Technology A, 31(1), 9. https://doi.org/10.1116/1.4756906 (Original work published 2013)

Knoops, H. C. M., Donders, M. E., van de Sanden, M. C. M., Notten, P. H. L., & Kessels, W. M. M. (2012). Atomic layer deposition for nanostructured Li-ion batteries. Journal of Vacuum Science & Technology A, 30(1), 010801. https://doi.org/10.1116/1.3660699 (Original work published 2012)

Hoex, B., van de Sanden, M. C. M., Schmidt, J., Brendel, R., & Kessels, W. M. M. (2012). Surface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3. Physica Status Solidi-Rapid Research Letters, 6(1), 4-6. https://doi.org/10.1002/pssr.201105445 (Original work published 2012)

Knoops, H. C. M., Langereis, E., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas. Journal of Vacuum Science & Technology A, 30(1), 01A101. https://doi.org/10.1116/1.3625565 (Original work published 2012)

Dingemans, G., Einsele, F., Beyer, W., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface. Journal of Applied Physics, 111(9), 093713. https://doi.org/10.1063/1.4709729 (Original work published 2012)

Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films. Electrochemical and Solid State Letters, 15(2), G1-G3. https://doi.org/10.1149/2.024202esl

Dingemans, G., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses. Plasma Processes and Polymers, 9(8), 761-771. https://doi.org/10.1002/ppap.201100196 (Original work published 2012)

Saadaoui, M., van Zeijl, H., Wien, W. H. A., Pham, H. T. M., Kwakernaak, C., Knoops, H. C. M., … Sarro, P. M. (2011). Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined with LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating. Ieee Transactions on Components Packaging and Manufacturing Technology, 1(11), 1728-1738. https://doi.org/10.1109/TCPMT.2011.2167969 (Original work published 2011)