W. M. M. Kessels

Dingemans, G., Mandoc, M. M., Bordihn, S., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks. Applied Physics Letters, 98(22), 222102. https://doi.org/10.1063/1.3595940 (Original work published 2011)

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S., Roozeboom, F., … Kessels, W. M. M. (2011). Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma. Journal of Vacuum Science & Technology A, 29(2), 021016. https://doi.org/10.1116/1.3554691 (Original work published 2011)

Dingemans, G., Terlinden, N. M., Verheijen, M. A., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition. Journal of Applied Physics, 110(9), 6. https://doi.org/10.1063/1.3658246 (Original work published 2011)

Profijt, H. B., Potts, S. E., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges. Journal of Vacuum Science & Technology A, 29(5), 26. https://doi.org/10.1116/1.3609974 (Original work published 2011)

Dingemans, G., Clark, A., van Delft, J. A., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100). Journal of Applied Physics, 109(11), 9. https://doi.org/10.1063/1.3595691 (Original work published 2011)

Profijt, H. B., Kudlacek, P., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides. Journal of the Electrochemical Society, 158(4), G88-G91. https://doi.org/10.1149/1.3552663

Langereis, E., Roijmans, R., Roozeboom, F., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors. Journal of the Electrochemical Society, 158(2), G34-G38. https://doi.org/10.1149/1.3522768

Donders, M. E., Knoops, H. C. M., van de Sanden, M. C. M., Kessels, W. M. M., & Notten, P. H. L. (2011). Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films. Journal of the Electrochemical Society, 158(4), G92-G96. https://doi.org/10.1149/1.3205041

Jinesh, K. B., van Hemmen, J. L., van de Sanden, M. C. M., Roozeboom, F., Klootwijk, J. H., Besling, W. F. A., & Kessels, W. M. M. (2011). Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films. Journal of the Electrochemical Society, 158(2), G21-G26. https://doi.org/10.1149/1.3517430

Dingemans, G., Terlinden, N. M., Pierreux, D., Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3. Electrochemical and Solid State Letters, 14(1), H1-H4. https://doi.org/10.1149/1.3501970