DIFFER
DIFFER Publication
Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
| Label | Value |
|---|---|
| Author | |
| Abstract |
The influence of ions and photons during remote plasma atomic layer deposition (ALD) of metal oxide thin films was investigated for different O-2 gas pressures and plasma powers. The ions have kinetic energies of |
| Year of Publication |
2011
|
| Journal |
Journal of the Electrochemical Society
|
| Volume |
158
|
| Issue |
4
|
| Number of Pages |
G88-G91
|
| Type of Article |
Article
|
| ISBN Number |
0013-4651
|
| DOI | |
| PId |
3c2b612a2f495f6d560b4651b5454bbd
|
| Alternate Journal |
J. Electrochem. Soc.
|
Journal Article
|
|
| Download citation |