H. B. Profijt

Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2013). Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth. Journal of Vacuum Science & Technology A, 31(1), 9. https://doi.org/10.1116/1.4756906 (Original work published 2013)

Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films. Electrochemical and Solid State Letters, 15(2), G1-G3. https://doi.org/10.1149/2.024202esl

Profijt, H. B., Potts, S. E., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges. Journal of Vacuum Science & Technology A, 29(5), 26. https://doi.org/10.1116/1.3609974 (Original work published 2011)

Dingemans, G., Terlinden, N. M., Pierreux, D., Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3. Electrochemical and Solid State Letters, 14(1), H1-H4. https://doi.org/10.1149/1.3501970

Profijt, H. B., Kudlacek, P., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides. Journal of the Electrochemical Society, 158(4), G88-G91. https://doi.org/10.1149/1.3552663