DIFFER
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Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

Label Value
Author
Abstract

Very low surface recombination velocities

Year of Publication
2011
Journal
Applied Physics Letters
Volume
98
Issue
22
Number of Pages
222102
Date Published
05/2011
Type of Article
Article
ISBN Number
0003-6951
DOI
PId
683cc0b3aef06f47b5995e663eb8f794
Alternate Journal
Appl. Phys. Lett.
Journal Article
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