DIFFER
DIFFER Publication
Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks
| Label | Value |
|---|---|
| Author | |
| Abstract |
Very low surface recombination velocities |
| Year of Publication |
2011
|
| Journal |
Applied Physics Letters
|
| Volume |
98
|
| Issue |
22
|
| Number of Pages |
222102
|
| Date Published |
05/2011
|
| Type of Article |
Article
|
| ISBN Number |
0003-6951
|
| DOI | |
| PId |
683cc0b3aef06f47b5995e663eb8f794
|
| Alternate Journal |
Appl. Phys. Lett.
|
Journal Article
|
|
| Download citation |
Citation
Dingemans, G., Mandoc, M. M., Bordihn, S., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks. Applied Physics Letters, 98(22), 222102. https://doi.org/10.1063/1.3595940 (Original work published 2011)