DIFFER

K. Sharma

First name
K.
Last name
Sharma
Sharma, K. ., Ponomarev, M. V., van de Sanden, M. C. M., & Creatore, M. . (2013). On the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon. Applied Physics Letters, 102, 212107. https://doi.org/10.1063/1.4809517
Sharma, K. ., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. . (2012). In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers. Journal of Applied Physics, 111(3), 6. https://doi.org/10.1063/1.3681185 (Original work published 2024)
Law, F. ., Hoex, B. ., Wang, J. ., Luther, J. ., Sharma, K. ., Creatore, M. ., & van de Sanden, M. C. M. (2012). Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H. Thin Solid Films, 520(17), 5820-5825. https://doi.org/10.1016/j.tsf.2012.04.056 (Original work published 2024)
Ponomarev, M. V., Sharma, K. ., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. . (2012). Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer. Journal of Applied Physics, 111(6), 063715. https://doi.org/10.1063/1.3692439 (Original work published 2024)
Sharma, K. ., Ponomarev, M. V., Verheijen, M. A., Kunz, O. ., Tichelaar, F. D., van de Sanden, M. C. M., & Creatore, M. . (2012). Solid-phase crystallization of ultra high growth rate amorphous silicon films. Journal of Applied Physics, 111(10), 5. https://doi.org/10.1063/1.4717951 (Original work published 2024)
Sharma, K. ., Branca, A. ., Illiberi, A. ., Tichelaar, F. D., Creatore, M. ., & van de Sanden, M. C. M. (2011). On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon. Advanced Energy Materials, 1(3), 401-406. https://doi.org/10.1002/aenm.201000074 (Original work published 2024)