DIFFER

E. W. J. M. van der Drift

First name
E.
Middle name
W. J. M.
Last name
van der Drift
Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., Zijlstra, T., de Groot, L. E. M., … Friedrich, J. (1997). Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science & Technology B, 15, 293-298. https://doi.org/10.1116/1.589309 (Original work published 1997)
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Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 1996)
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Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 1993)
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