Rkfj Bastiaensen

Shevelko, A. P., Shmaenok, L. A., Churilov, S. S., Bastiaensen, R. ., & Bijkerk, F. . (1998). Extreme ultraviolet spectroscopy of a laser plasma source for lithography. Physica Scripta, 57, 276-282. https://doi.org/10.1088/0031-8949/57/2/023 (Original work published 2025)

Bijkerk, F. ., Shmaenok, L. A., Louis, E. ., Voorma, H. J., Koster, N. B., Bruineman, C. ., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 2025)