T. Zijlstra

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., Zijlstra, T., de Groot, L. E. M., … Friedrich, J. (1997). Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science & Technology B, 15, 293-298. https://doi.org/10.1116/1.589309 (Original work published 1997)

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 1996)