M. Yan

Herrebout, D. ., Bogaerts, A. ., Yan, M. ., Gijbels, R. ., Goedheer, W. ., & Dekempeneer, E. . (2001). One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers. Journal of Applied Physics, 90, 570-579. https://doi.org/10.1063/1.1378059 (Original work published)

Yan, M. ., Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. J. (2001). Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge. Physical Review E, 63. https://doi.org/10.1103/PhysRevE.63.026405 (Original work published 2025)

Chutov, Y. I., Goedheer, W. J., . Y. Kravchenko, O. ., Zuz, V. M., Yan, M. ., Martins, R. ., … Kroesen, G. . (2000). Radio frequency discharge with dust particles. In Plasma Processing and Dusty Particles (Vol. 382, pp. 69-79).

Yan, M. ., Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. J. (2000). Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: Comparison between Ar and SiH4. Journal of Applied Physics, 87, 3628-3636. https://doi.org/10.1063/1.372392 (Original work published)

Yan, M. ., Bogaerts, A. ., Goedheer, W. J., & Gijbels, R. . (2000). Electron energy distribution function in capacitively coupled RF discharges: difference between electropositive Ar and electronegative SiH4 discharges. Plasma Sources Science & Technology, 9, 583-591. https://doi.org/10.1088/0963-0252/9/4/314 (Original work published 2025)

Bogaerts, A. ., Yan, M. ., Gijbels, R. ., & Goedheer, W. . (1999). Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge. Journal of Applied Physics, 86, 2990-3001. https://doi.org/10.1063/1.371159 (Original work published)

Yan, M. ., & Goedheer, W. J. (1999). Particle-in-cell/Monte Carlo simulation of radio frequency SiH4/H-2 discharges. Ieee Transactions on Plasma Science, 27, 1399-1405. https://doi.org/10.1109/27.799818 (Original work published 2025)

Yan, M. ., & Goedheer, W. J. (1999). A PIC-MC simulation of the effect of frequency on the characteristics of VHFSiH4/H-2 discharges. Plasma Sources Science & Technology, 8, 349-354. https://doi.org/10.1088/0963-0252/8/3/302 (Original work published 2025)

Yan, M. ., & Goedheer, W. J. (1998). A kinetic simulation of the effect of frequency on the power dissipation in VHF SiH4/H-2 discharges. Czechoslovak Journal of Physics, 48, 257-262. https://doi.org/10.1007/s10582-998-0051-7 (Original work published 1998)