DIFFER

W. Goedheer

First name
W.
Last name
Goedheer
Bogaerts, A. ., Yan, M. ., Gijbels, R. ., & Goedheer, W. . (1999). Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge. Journal of Applied Physics, 86, 2990-3001. https://doi.org/10.1063/1.371159 (Original work published)
Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. . (1999). Comparison between a radio-frequency and direct current glow discharge in argon by a hybrid Monte Carlo-fluid model for electrons, argon ions and fast argon atoms. Spectrochimica Acta Part B-Atomic Spectroscopy, 54, 1335-1350. https://doi.org/10.1016/s0584-8547(99)00080-4 (Original work published)
Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. . (1999). Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: Combined Monte Carlo and fluid model. Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 38, 4404-4415. https://doi.org/10.1143/jjap.38.4404 (Original work published 2025)
Nienhuis, G. J., & Goedheer, W. . (1999). Modelling of a large scale reactor for plasma deposition of silicon. Plasma Sources Science & Technology, 8, 295-298. https://doi.org/10.1088/0963-0252/8/2/310 (Original work published 2025)