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Terahertz Raman laser based on silicon doped with phosphorus

Author
Abstract

Raman-type stimulated emission at frequencies between 5.0 and 5.2 THz as well as between 6.1 and 6.4 THz has been realized in silicon crystals doped by phosphorus donors. The Raman laser operates at around 5 K under optical excitation by a pulsed, frequency-tunable infrared free electron laser. The frequencies of the observed laser emission are close to the frequencies of the intracenter laser lines which originate from the 2p(0) and 2p(+/-) phosphorus states. The Stokes shift of 3.16 THz is equal to the difference between the energies of the phosphorus ground state, 1s(A(1)), and the 1s(E) excited state. (C) 2008 American Institute of Physics.

Year of Publication
2008
Journal
Applied Physics Letters
Volume
92
Number
9
Number of Pages
3
Date Published
Mar
Type of Article
Article
ISBN Number
0003-6951
Accession Number
ISI:000253761500011
URL
<Go to ISI>://000253761500011
PId
5b51d2f7f7f12f33422b86a54f1baaf9
Alternate Journal
Appl. Phys. Lett.
Journal Article
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