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Label | Value |
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Author | |
Abstract |
Currently, in the photovoltaic industry, wet chemical etching technologies are used for saw damage removal and surface texturing. Alternative to wet chemical etching is plasma etching. However, as for example, the linear microwave plasma technique, developed by Roth&Rau, has not been implemented in the photovoltaic industry for etching, because of the very low etch rate ( |
Year of Publication |
2015
|
Journal |
Progress in Photovoltaics: Research and Applications
|
Volume |
23
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Issue |
3
|
Number of Pages |
352-366
|
DOI | |
PId |
c9169d3e6ae4502bf2c83646b23245aa
|
Alternate Journal |
Prog. Photovolt.: Res. Appl.
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Journal Article
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