Characterisation of Tungsten Nitride Layers and their Erosion under Plasma Exposure in NANO-PSI

The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N-2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device.