DIFFER
DIFFER Publication
Characterisation of Tungsten Nitride Layers and their Erosion under Plasma Exposure in NANO-PSI
| Label | Value |
|---|---|
| Author | |
| Abstract |
The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N-2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device. |
| Year of Publication |
2015
|
| Journal |
Romanian Reports in Physics
|
| Volume |
67
|
| Issue |
2
|
| Number of Pages |
532-546
|
| Date Published |
2015
|
| ISBN Number |
1221-1451
|
| URL | |
| PId |
ac586477904f72ea394490e6f8fbf624
|
| Alternate Journal |
Romanian Rep. Phys.
|
| Label |
OA
|
Journal Article
|
|
| Download citation |
Citation
Alegre, D., Acsente, T., Martin-Rojo, A. B., Oyarzabal, E., Tabares, F. L., Dinescu, G., … Mozetic, M. (2015). Characterisation of Tungsten Nitride Layers and their Erosion under Plasma Exposure in NANO-PSI. Romanian Reports in Physics, 67(2), 532-546. Retrieved from http://www.rrp.infim.ro/2015_67_2/A23.pdf (Original work published 2015)