DIFFER
DIFFER Publication
Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2018
|
| Degree |
PhD
|
| Date Published |
2018/12/04
|
| Thesis Type |
PhD
|
| University |
Eindhoven University of Technology
|
| City |
Eindhoven, Netherlands
|
| ISBN Number |
9789038646527
|
| URL | |
| PId |
ac3638a55ac9690a0860f25bf73c8dcd
|
Thesis
|
|
| Download citation |