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Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2018
|
| Degree |
PhD
|
| Date Published |
2018/12/04
|
| Thesis Type |
PhD
|
| University |
Eindhoven University of Technology
|
| City |
Eindhoven, Netherlands
|
| ISBN Number |
9789038646527
|
| URL | |
| PId |
ac3638a55ac9690a0860f25bf73c8dcd
|
Thesis
|
|
| Download citation |
Citation
Meshkova, A. S. (2018). Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) of silica: Understanding the role of the local deposition rate in the surface and film morphology (Eindhoven University of Technology). Eindhoven University of Technology, Eindhoven, Netherlands. Retrieved from https://research.tue.nl/en/publications/atmospheric-pressure-plasma-enhanced-chemical-vapour-deposition-o-2 (Original work published)