|Title||Characterization of the Resolving Power of a Double Multilayer Monochromator in the Energy-Range of 600-900 Ev|
|Publication Type||Journal Article|
|Year of Publication||1991|
|Authors||E.J Puik, G.E van Dorssen, M.J van der Wiel, J. Verhoeven, G. Vanderlaan, H.A Padmore|
|Journal||Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films|
Two different pairs of x-ray reflecting multilayer coatings have been tested in a double crystal monochromator configuration. The two pairs consisted of Ni (0.4 nm)-C (1.85 nm) and NiSi (0.4 nm)-C (1.85 nm), both with 225 periods. In order to determine the resolution in the energy range of 600-900 eV, the photoelectron yield of several 3d transition metal compounds was recorded as well as the throughput around the Ni L lines. We found for both pairs a resolving power of 220. Simulations taking into account the angular divergence of the x-ray beam yield a resolution of 250. The difference with the observed value can be due to the nonhomogeneity of the multilayer coating.
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