Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

TitleMultilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
Publication TypeJournal Article
Year of Publication2013
AuthorsV.V Medvedev, R.WE van de Kruijs, A.E Yakshin, N.N Novikova, V.M Krivtsun, E. Louis, A.M Yakunin, F. Bijkerk
JournalApplied Physics Letters
Volume103
Number22
Pagination221114
Abstract

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN/B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems. © 2013 AIP Publishing LLC.

URLhttp://scitation.aip.org/content/aip/journal/apl/103/22/10.1063/1.4837335
DOI10.1063/1.4837335
Division

nSI

Department

TFM

PID

335ee0f9b8d2f448495d8fadb5686dbc

Alternate TitleAppl. Phys. Lett.

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