High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography

TitleHigh Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography
Publication TypeJournal Article
Year of Publication1992
AuthorsF. Bijkerk, E. Louis, E.CI Turcu, G.J Tallents
JournalMicroelectronic Engineering
Volume17
Number1-4
Pagination219-222
Date PublishedMar
ISBN Number0167-9317
Abstract

As part of a development programme for a high-intensity laser-plasma X-ray source, experiments have been carried out using a high repetition rate excimer laser (up to 100 Hz; 249 nm, 300 mJ). Remedies are given to problems inherent to operating this type of source at high repetition rates. The combined remedies eliminate the target debris problem. X-ray mask structures down to 0.5-mu-m have been imaged. After implementation of tested upgrades, this source will enable exposures within ten seconds per stepfield.

DOI10.1016/0167-9317(92)90045-s
PID

6649a9968d12c4275f4dc9f76949986a

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