Title | High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography |
Publication Type | Journal Article |
Year of Publication | 1992 |
Authors | F. Bijkerk, E. Louis, E.CI Turcu, G.J Tallents |
Journal | Microelectronic Engineering |
Volume | 17 |
Number | 1-4 |
Pagination | 219-222 |
Date Published | Mar |
ISBN Number | 0167-9317 |
Abstract | As part of a development programme for a high-intensity laser-plasma X-ray source, experiments have been carried out using a high repetition rate excimer laser (up to 100 Hz; 249 nm, 300 mJ). Remedies are given to problems inherent to operating this type of source at high repetition rates. The combined remedies eliminate the target debris problem. X-ray mask structures down to 0.5-mu-m have been imaged. After implementation of tested upgrades, this source will enable exposures within ten seconds per stepfield. |
DOI | 10.1016/0167-9317(92)90045-s |
PID | 6649a9968d12c4275f4dc9f76949986a |
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