Enhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density

TitleEnhanced Reflectivity of Soft-X-Ray Multilayer Mirrors by Reduction of Si Atomic Density
Publication TypeJournal Article
Year of Publication1993
AuthorsR. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven, M.J van der Wiel
JournalApplied Physics Letters
Volume63
Number24
Pagination3297-3299
Date PublishedDec 13
ISBN Number0003-6951
Abstract

We report a significant increase of the reflectivity of a soft x-ray Mo/Si multilayer mirror after low energy hydrogen ion beam bombardment of each of the Si layers after deposition. Cross section transmission electron microscopy pictures indicate no significant qualitative difference in interface roughness between the two samples. Elastic recoil detection and Rutherford backscattering spectrometry reveal a concentration of 22 at. % of H in the ion beam bombarded Si layers and a 12% reduction of the Si atomic density. Calculations using the measured atomic density and a very simple roughness model agree with the measured reflectivities. This is the first report of the modification of atomic density of Si in order to change the x-ray optical constants of the Si layer.

DOI10.1063/1.110179
PID

4c85c2c399eefad95c934362af1dcca8

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