Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes

TitleSoft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes
Publication TypeJournal Article
Year of Publication1993
AuthorsE. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw, F. Voss, R. Desor, B. Nikolaus
JournalMicroelectronic Engineering
Volume21
Number1-4
Pagination67-70
Date PublishedApr
ISBN Number0167-9317
Abstract

In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources. fabrication of multilayer x-ray mirrors. and patterning of reflection masks. We are in the process of optimization of a laser-plasma x-ray source and measured the conversion-efficiency of laser light into x-rays. Furthermore we present results of etching patterns in x-ray reflection masks and we discuss improved deposition techniques to produce multilayer coatings with enhanced reflectivity.

DOI10.1016/0167-9317(93)90028-4
PID

1c1c525d8670bef3c855827a711ed070

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