| Title | Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes |
| Publication Type | Journal Article |
| Year of Publication | 1993 |
| Authors | E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw, F. Voss, R. Desor, B. Nikolaus |
| Journal | Microelectronic Engineering |
| Volume | 21 |
| Number | 1-4 |
| Pagination | 67-70 |
| Date Published | Apr |
| ISBN Number | 0167-9317 |
| Abstract | In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources. fabrication of multilayer x-ray mirrors. and patterning of reflection masks. We are in the process of optimization of a laser-plasma x-ray source and measured the conversion-efficiency of laser light into x-rays. Furthermore we present results of etching patterns in x-ray reflection masks and we discuss improved deposition techniques to produce multilayer coatings with enhanced reflectivity. |
| DOI | 10.1016/0167-9317(93)90028-4 |
| PID | 1c1c525d8670bef3c855827a711ed070 |
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