A. C.W. Biebericher

Biebericher, A. C., van der Weg, W., Rath, J., Akdim, M., & Goedheer, W. J. (2003). Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges. Journal of Vacuum Science & Technology A, 21, 156-166. Retrieved from <Go to ISI>://000182598200023 (Original work published 2003)

Biebericher, A. C., van der Weg, W., Goedheer, W. J., & Rath, J. (2002). Mechanism of argon treatment on a growing surface in layer-by-layer deposition of hydrogenated amorphous silicon. Journal of Non-Crystalline Solids, 299, 74-78. Retrieved from <Go to ISI>://000175757400016 (Original work published 2002)

Biebericher, A. C., Bezemer, J., van der Weg, W., & Goedheer, W. J. (2000). Deposition rate in modulated radio-frequency silane plasmas. Applied Physics Letters, 76, 2002-2004. https://doi.org/10.1063/1.126235 (Original work published 2000)