DIFFER
DIFFER Publication
Mechanism of argon treatment on a growing surface in layer-by-layer deposition of hydrogenated amorphous silicon
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2002
|
| Journal |
Journal of Non-Crystalline Solids
|
| Volume |
299
|
| Number of Pages |
74-78
|
| Date Published |
04/2002
|
| ISBN Number |
0022-3093
|
| Accession Number |
ISI:000175757400016
|
| URL | |
| PId |
104969411b047e0b0fc61a5077a86176
|
Journal Article
|
|
| Download citation |
Citation
Biebericher, A. C., van der Weg, W., Goedheer, W. J., & Rath, J. (2002). Mechanism of argon treatment on a growing surface in layer-by-layer deposition of hydrogenated amorphous silicon. Journal of Non-Crystalline Solids, 299, 74-78. Retrieved from <Go to ISI>://000175757400016 (Original work published 2002)