DIFFER
DIFFER Publication
Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2003
|
| Journal |
Journal of Vacuum Science & Technology A
|
| Volume |
21
|
| Number |
1
|
| Number of Pages |
156-166
|
| Date Published |
01/2003
|
| ISBN Number |
0734-2101
|
| Accession Number |
ISI:000182598200023
|
| URL | |
| PId |
d6dedd31a0679902b4388ee059319226
|
Journal Article
|
|
| Download citation |
Citation
Biebericher, A. C., van der Weg, W., Rath, J., Akdim, M., & Goedheer, W. J. (2003). Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges. Journal of Vacuum Science & Technology A, 21, 156-166. Retrieved from <Go to ISI>://000182598200023 (Original work published 2003)