Biebericher, A. C., van der Weg, W., Rath, J., Akdim, M., & Goedheer, W. J. (2003). Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges. Journal of Vacuum Science & Technology A, 21, 156-166. Retrieved from <Go to ISI>://000182598200023 (Original work published 2003)
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