S. Muellender

Makhotkin, I., Zoethout, E., Louis, E., Yakunin, A. M., Muellender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published)

Krist, T., Teichert, A., Zoethout, E., Bijkerk, F., Meltchakov, E., Vidal, V., & Muellender, S. (2008). Stress Reduction in Multilayers Used for X-Ray and Neutron Optics. In Modern Developments in X-Ray and Neutron Optics, Springer Series in Optical Sciences (Vol. 137). Springer. https://doi.org/10.1007/978-3-540-74561-7_23

Nedelcu, I., de Kruijs, R., Yakshin, A. E., Tichelaar, F., Zoethout, E., Louis, E., … Bijkerk, F. (2006). Interface roughness in Mo/Si multilayers. Thin Solid Films, 515, 434-438. Retrieved from <Go to ISI>://000241220600012 (Original work published 2025)