S. Muellender

Makhotkin, I. ., Zoethout, E. ., Louis, E. ., Yakunin, A. M., Muellender, S. ., & Bijkerk, F. . (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published)

Krist, T. ., Teichert, A. ., Zoethout, E. ., Bijkerk, F. ., Meltchakov, E. ., Vidal, V. ., & Muellender, S. . (2008). Stress Reduction in Multilayers Used for X-Ray and Neutron Optics. In Modern Developments in X-Ray and Neutron Optics, Springer Series in Optical Sciences (Vol. 137). Springer. https://doi.org/10.1007/978-3-540-74561-7_23

Nedelcu, I. ., de Kruijs, R. ., Yakshin, A. E., Tichelaar, F. ., Zoethout, E. ., Louis, E. ., … Bijkerk, F. . (2006). Interface roughness in Mo/Si multilayers. Thin Solid Films, 515, 434-438. Retrieved from <Go to ISI>://000241220600012 (Original work published 2024)