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Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet

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Abstract

The spectral properties of LaN/B and LaN∕B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN∕B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Year of Publication
2012
Journal
Journal of Micro/Nanolithography, MEMS and MOEMS
Volume
11
Number
4
Start Page
040501-1
Number of Pages
040501
Date Published
10/2012
Publisher
SPIE
Type of Article
Journal article
DOI
PId
d04eded6ff93f68fcdbd712ae2d7ce2a
Alternate Journal
J. Micro-Nanolithogr. MEMS MOEMS
Label
OA
Journal Article
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Citation
Makhotkin, I., Zoethout, E., Louis, E., Yakunin, A. M., Muellender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published 2012)