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Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet

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Author
Abstract

The spectral properties of LaN/B and LaN∕B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN∕B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Year of Publication
2012
Journal
Journal of Micro/Nanolithography, MEMS and MOEMS
Volume
11
Number
4
Start Page
040501-1
Number of Pages
040501
Date Published
19-Oct-12
Publisher
SPIE
Type of Article
Journal article
DOI
PId
d04eded6ff93f68fcdbd712ae2d7ce2a
Alternate Journal
J. Micro-Nanolithogr. MEMS MOEMS
Label
OA
Journal Article
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