J. Q. Chen

Liu, F., Lee, C. J., Chen, J. Q., Louis, E., van der Slot, P. J. M., Boller, K. J., & Bijkerk, F. (2012). Ellipsometry with randomly varying polarization states. Optics Express, 20(2), 870-878. https://doi.org/10.1364/OE.20.000870 (Original work published 2025)

Chen, J. Q., Louis, E., Wormeester, H., Harmsen, R., van de Kruijs, R., Lee, C. J., … Bijkerk, F. (2011). Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology, 22(10), 105705. https://doi.org/10.1088/0957-0233/22/10/105705 (Original work published 2025)

Chen, J. Q., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., … Bijkerk, F. (2011). In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science, 258(1), 7-12. https://doi.org/10.1016/j.apsusc.2011.07.121 (Original work published 2025)

Chen, J. Q. (2011). Characterization of EUV induced contamination on multilayer optics (University of Twente). University of Twente, Enschede, Netherlands. Retrieved from http://doc.utwente.nl/77597/ (Original work published 2011)

Chen, J. Q., Louis, E., Verhoeven, J., Harmsen, R., Lee, C. J., Lubomska, M., … Bijkerk, F. (2010). Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257, 354-361. Retrieved from <Go to ISI>://000281674200003 (Original work published 2025)

Chen, J. Q., Louis, E., Lee, C. J., Wormeester, H., Kunze, R., Schmidt, H., … Bijkerk, F. (2009). Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express, 17, 16969-16979. Retrieved from <Go to ISI>://000269736100067 (Original work published 2025)

Chen, J. Q., Lee, C. J., Louis, E., Bijkerk, F., Kunze, R., Schmidt, H., … Moors, R. (2009). Characterization of EUV induced carbon films using laser-generated surface acoustic waves. Elsevier Science Sa. Retrieved from <Go to ISI>://000267737000017