DIFFER

M. C. M. van de Sanden

First name
M.
Middle name
C. M.
Last name
van de Sanden
ORCID
0000-0002-4119-9971
Bystrov, K., van de Sanden, M. C. M., Arnas, C., Marot, L., Mathys, D., Liu, F., … De Temmerman, G. (2014). Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas. Carbon, 68, 695-707. https://doi.org/http://dx.doi.org/10.1016/j.carbon.2013.11.051
Weber, J. W., Bol, A. A., & van de Sanden, M. C. M. (2014). An improved thin film approximation to accurately determine the optical conductivity of graphene from infrared transmittance. Applied Physics Letters, 105, 013105. https://doi.org/http://dx.doi.org/10.1063/1.4889852
Dogan, I., Weeks, S. L., Agarwal, S., & van de Sanden, M. C. M. (2014). Nucleation of silicon nanocrystals in a remote plasma without subsequent coagulation. Journal of Applied Physics, 115(24), 244301. https://doi.org/http://dx.doi.org/10.1063/1.4885195
van Assche, F. J. H., Unnikrishnan, S., Michels, J. J., van Mol, A. M. B., van de Weijer, P., van de Sanden, M. C. M., & Creatore, M. (2014). On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers. Thin Solid Films, 558(2 May 2014), 54-61. https://doi.org/http://dx.doi.org/10.1016/j.tsf.2014.02.069
Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2013). Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth. Journal of Vacuum Science & Technology A, 31(1), 9. https://doi.org/10.1116/1.4756906 (Original work published 2013)
Bystrov, K., Morgan, T. W., Tanyeli, I., De Temmerman, G., & van de Sanden, M. C. M. (2013). Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities. Journal of Applied Physics, 114, 133301. https://doi.org/10.1063/1.4822166 (Original work published 2013)
Bronneberg, A. C., Kang, X., Palmans, J., Janssen, P. H. J., Lorne, T., Creatore, M., & van de Sanden, M. C. M. (2013). Direct ion flux measurements at high-pressure-depletion conditions for microcrystalline silicon deposition. Journal of Applied Physics, 114(6), 063305. https://doi.org/10.1063/1.4817859
Dogan, I., & van de Sanden, M. C. M. (2013). Direct characterization of nanocrystal size distribution using Raman spectroscopy. Journal of Applied Physics, 114(13), 134310. https://doi.org/10.1063/1.4824178
Premkumar, P. A., Starostin, S. A., de Vries, H., Creatore, M., Koenraad, P. M., & van de Sanden, M. C. M. (2013). Morphological Description of Ultra-Smooth Organo-Silicone Layers Synthesized Using Atmospheric Pressure Dielectric Barrier Discharge Assisted PECVD. Plasma Processes and Polymers, 10, 313–319. https://doi.org/10.1002/ppap.201200016
de Respinis, M., De Temmerman, G., Tanyeli, I., van de Sanden, M. C. M., Doerner, R. P., Baldwin, M. J., & van de Krol, R. (2013). Efficient Plasma Route to Nanostructure Materials: Case Study on the Use of m-WO3 for Solar Water Splitting. ACS Applied Materials & Interfaces, 5, 7621-7625. https://doi.org/10.1021/am401936q