DIFFER

M. C. M. van de Sanden

First name
M.
Middle name
C. M.
Last name
van de Sanden
ORCID
0000-0002-4119-9971
Bronneberg, A. C., Kang, X., Palmans, J., Janssen, P. H. J., Lorne, T., Creatore, M., & van de Sanden, M. C. M. (2013). Direct ion flux measurements at high-pressure-depletion conditions for microcrystalline silicon deposition. Journal of Applied Physics, 114(6), 063305. https://doi.org/10.1063/1.4817859
Dogan, I., & van de Sanden, M. C. M. (2013). Direct characterization of nanocrystal size distribution using Raman spectroscopy. Journal of Applied Physics, 114(13), 134310. https://doi.org/10.1063/1.4824178
Premkumar, P. A., Starostin, S. A., de Vries, H., Creatore, M., Koenraad, P. M., & van de Sanden, M. C. M. (2013). Morphological Description of Ultra-Smooth Organo-Silicone Layers Synthesized Using Atmospheric Pressure Dielectric Barrier Discharge Assisted PECVD. Plasma Processes and Polymers, 10, 313–319. https://doi.org/10.1002/ppap.201200016
de Respinis, M., De Temmerman, G., Tanyeli, I., van de Sanden, M. C. M., Doerner, R. P., Baldwin, M. J., & van de Krol, R. (2013). Efficient Plasma Route to Nanostructure Materials: Case Study on the Use of m-WO3 for Solar Water Splitting. ACS Applied Materials & Interfaces, 5, 7621-7625. https://doi.org/10.1021/am401936q
Sharma, K., Ponomarev, M. V., van de Sanden, M. C. M., & Creatore, M. (2013). On the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon. Applied Physics Letters, 102, 212107. https://doi.org/10.1063/1.4809517
Dogan, I., Kramer, N. J., Westermann, R. H. J., Dohnalova, K., Smets, A. H. M., Verheijen, M. A., … van de Sanden, M. C. M. (2013). Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution. Journal of Applied Physics, 113, 134306. https://doi.org/10.1063/1.4799402
Narayanan, B., Weeks, S. L., Jariwala, B. N., Macco, B., Weber, J., Rathi, S. J., … Ciobanu, C. V. (2013). Carbon monoxide-induced reduction and healing of graphene oxide. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 31, 040601.
Sharma, K., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. (2012). In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers. Journal of Applied Physics, 111(3), 6. https://doi.org/10.1063/1.3681185 (Original work published 2025)
Knoops, H. C. M., Donders, M. E., van de Sanden, M. C. M., Notten, P. H. L., & Kessels, W. M. M. (2012). Atomic layer deposition for nanostructured Li-ion batteries. Journal of Vacuum Science & Technology A, 30(1), 010801. https://doi.org/10.1116/1.3660699 (Original work published 2025)
Hoex, B., van de Sanden, M. C. M., Schmidt, J., Brendel, R., & Kessels, W. M. M. (2012). Surface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3. Physica Status Solidi-Rapid Research Letters, 6(1), 4-6. https://doi.org/10.1002/pssr.201105445 (Original work published 2025)