DIFFER

M. C. M. van de Sanden

First name
M.
Middle name
C. M.
Last name
van de Sanden
ORCID
0000-0002-4119-9971
Bronneberg, A. C., Kang, X., Palmans, J., Janssen, P. H. J., Lorne, T., Creatore, M., & van de Sanden, M. C. M. (2013). Direct ion flux measurements at high-pressure-depletion conditions for microcrystalline silicon deposition. Journal of Applied Physics, 114(6), 063305. https://doi.org/10.1063/1.4817859
Dogan, I., & van de Sanden, M. C. M. (2013). Direct characterization of nanocrystal size distribution using Raman spectroscopy. Journal of Applied Physics, 114(13), 134310. https://doi.org/10.1063/1.4824178
Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2013). Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth. Journal of Vacuum Science & Technology A, 31(1), 9. https://doi.org/10.1116/1.4756906 (Original work published 2013)
Bystrov, K., Morgan, T. W., Tanyeli, I., De Temmerman, G., & van de Sanden, M. C. M. (2013). Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities. Journal of Applied Physics, 114, 133301. https://doi.org/10.1063/1.4822166 (Original work published 2013)
Premkumar, P. A., Starostin, S. A., de Vries, H., Creatore, M., Koenraad, P. M., & van de Sanden, M. C. M. (2013). Morphological Description of Ultra-Smooth Organo-Silicone Layers Synthesized Using Atmospheric Pressure Dielectric Barrier Discharge Assisted PECVD. Plasma Processes and Polymers, 10, 313–319. https://doi.org/10.1002/ppap.201200016
de Respinis, M., De Temmerman, G., Tanyeli, I., van de Sanden, M. C. M., Doerner, R. P., Baldwin, M. J., & van de Krol, R. (2013). Efficient Plasma Route to Nanostructure Materials: Case Study on the Use of m-WO3 for Solar Water Splitting. ACS Applied Materials & Interfaces, 5, 7621-7625. https://doi.org/10.1021/am401936q
Sharma, K., Ponomarev, M. V., van de Sanden, M. C. M., & Creatore, M. (2013). On the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon. Applied Physics Letters, 102, 212107. https://doi.org/10.1063/1.4809517
Dogan, I., Kramer, N. J., Westermann, R. H. J., Dohnalova, K., Smets, A. H. M., Verheijen, M. A., … van de Sanden, M. C. M. (2013). Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution. Journal of Applied Physics, 113, 134306. https://doi.org/10.1063/1.4799402
Narayanan, B., Weeks, S. L., Jariwala, B. N., Macco, B., Weber, J., Rathi, S. J., … Ciobanu, C. V. (2013). Carbon monoxide-induced reduction and healing of graphene oxide. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 31, 040601.
Sharma, K., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. (2012). In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers. Journal of Applied Physics, 111(3), 6. https://doi.org/10.1063/1.3681185 (Original work published 2012)