M. C. M. van de Sanden

van Harskamp, W. E. N., Brouwer, C. M., Schram, D. C., van de Sanden, M. C. M., & Engeln, R. (2011). Population inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process. Physical Review E, 83(3), 036412. https://doi.org/10.1103/PhysRevE.83.036412 (Original work published 2011)

Dingemans, G., Clark, A., van Delft, J. A., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100). Journal of Applied Physics, 109(11), 9. https://doi.org/10.1063/1.3595691 (Original work published 2011)

Illiberi, A., Kudlacek, P., Smets, A. H. M., Creatore, M., & van de Sanden, M. C. M. (2011). Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces. Applied Physics Letters, 98(24), 3. https://doi.org/10.1063/1.3601485 (Original work published 2011)

Zaharia, T., Kudlacek, P., Creatore, M., Groenen, R., Persoone, P., & van de Sanden, M. C. M. (2011). Improved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films. Diamond and Related Materials, 20(9), 1266-1272. https://doi.org/10.1016/j.diamond.2011.08.003 (Original work published 2011)

Jariwala, B. N., Kramer, N. J., Petcu, M. C., Bobela, D. C., van de Sanden, M. C. M., Stradins, P., … Agarwal, S. (2011). Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles. Journal of Physical Chemistry C, 115(42), 20375-20379. https://doi.org/10.1021/jp2028005 (Original work published 2011)

Hansen, T. A. R., Colsters, P. G. J., van de Sanden, M. C. M., & Engeln, R. (2011). Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra. Journal of Physics D-Applied Physics, 44(35), 355205. https://doi.org/10.1088/0022-3727/44/35/355205 (Original work published 2011)

Weber, J. W., Hinrichs, K., Gensch, M., van de Sanden, M. C. M., & Oates, T. W. H. (2011). Microfocus infrared ellipsometry characterization of air-exposed graphene flakes. Applied Physics Letters, 99(6), 3. https://doi.org/10.1063/1.3624826 (Original work published 2011)

Jinesh, K. B., van Hemmen, J. L., van de Sanden, M. C. M., Roozeboom, F., Klootwijk, J. H., Besling, W. F. A., & Kessels, W. M. M. (2011). Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films. Journal of the Electrochemical Society, 158(2), G21-G26. https://doi.org/10.1149/1.3517430

Dingemans, G., Terlinden, N. M., Pierreux, D., Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3. Electrochemical and Solid State Letters, 14(1), H1-H4. https://doi.org/10.1149/1.3501970

Profijt, H. B., Kudlacek, P., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides. Journal of the Electrochemical Society, 158(4), G88-G91. https://doi.org/10.1149/1.3552663