M. C. M. van de Sanden

Jariwala, B. N., Kramer, N. J., Petcu, M. C., Bobela, D. C., van de Sanden, M. C. M., Stradins, P., … Agarwal, S. (2011). Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles. Journal of Physical Chemistry C, 115(42), 20375-20379. https://doi.org/10.1021/jp2028005 (Original work published 2011)

Hansen, T. A. R., Colsters, P. G. J., van de Sanden, M. C. M., & Engeln, R. (2011). Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra. Journal of Physics D-Applied Physics, 44(35), 355205. https://doi.org/10.1088/0022-3727/44/35/355205 (Original work published 2011)

Weber, J. W., Hinrichs, K., Gensch, M., van de Sanden, M. C. M., & Oates, T. W. H. (2011). Microfocus infrared ellipsometry characterization of air-exposed graphene flakes. Applied Physics Letters, 99(6), 3. https://doi.org/10.1063/1.3624826 (Original work published 2011)

Jinesh, K. B., van Hemmen, J. L., van de Sanden, M. C. M., Roozeboom, F., Klootwijk, J. H., Besling, W. F. A., & Kessels, W. M. M. (2011). Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films. Journal of the Electrochemical Society, 158(2), G21-G26. https://doi.org/10.1149/1.3517430

Dingemans, G., Terlinden, N. M., Pierreux, D., Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3. Electrochemical and Solid State Letters, 14(1), H1-H4. https://doi.org/10.1149/1.3501970

Profijt, H. B., Kudlacek, P., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides. Journal of the Electrochemical Society, 158(4), G88-G91. https://doi.org/10.1149/1.3552663

Langereis, E., Roijmans, R., Roozeboom, F., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors. Journal of the Electrochemical Society, 158(2), G34-G38. https://doi.org/10.1149/1.3522768

Donders, M. E., Knoops, H. C. M., van de Sanden, M. C. M., Kessels, W. M. M., & Notten, P. H. L. (2011). Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films. Journal of the Electrochemical Society, 158(4), G92-G96. https://doi.org/10.1149/1.3205041

Meier, M., Muthmann, S., Flikweert, A. J., Dingemans, G., van de Sanden, M. C. M., & Gordijn, A. (2011). In-situ transmission measurements as process control for thin-film silicon solar cells. Solar Energy Materials and Solar Cells, 95(12), 3328-3332. https://doi.org/10.1016/j.solmat.2011.07.022 (Original work published 2011)

Bronneberg, A. C., Smets, A. H. M., Creatore, M., & van de Sanden, M. C. M. (2011). On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy. Journal of Non-Crystalline Solids, 357(3), 884-887. https://doi.org/10.1016/j.jnoncrysol.2010.11.001 (Original work published 2011)