M. C. M. van de Sanden

Dingemans, G., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses. Plasma Processes and Polymers, 9(8), 761-771. https://doi.org/10.1002/ppap.201100196 (Original work published 2012)

Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide. Journal of Applied Physics, 112(4), 04370. https://doi.org/10.1063/1.4747942 (Original work published 2012)

Dingemans, G., Mandoc, M. M., Bordihn, S., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks. Applied Physics Letters, 98(22), 222102. https://doi.org/10.1063/1.3595940 (Original work published 2011)

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S., Roozeboom, F., … Kessels, W. M. M. (2011). Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma. Journal of Vacuum Science & Technology A, 29(2), 021016. https://doi.org/10.1116/1.3554691 (Original work published 2011)

Sharma, K., Branca, A., Illiberi, A., Tichelaar, F. D., Creatore, M., & van de Sanden, M. C. M. (2011). On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon. Advanced Energy Materials, 1(3), 401-406. https://doi.org/10.1002/aenm.201000074 (Original work published 2011)

Dingemans, G., Terlinden, N. M., Verheijen, M. A., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition. Journal of Applied Physics, 110(9), 6. https://doi.org/10.1063/1.3658246 (Original work published 2011)

van Harskamp, W. E. N., Brouwer, C. M., Schram, D. C., van de Sanden, M. C. M., & Engeln, R. (2011). Population inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process. Physical Review E, 83(3), 036412. https://doi.org/10.1103/PhysRevE.83.036412 (Original work published 2011)

Dingemans, G., Clark, A., van Delft, J. A., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100). Journal of Applied Physics, 109(11), 9. https://doi.org/10.1063/1.3595691 (Original work published 2011)

Illiberi, A., Kudlacek, P., Smets, A. H. M., Creatore, M., & van de Sanden, M. C. M. (2011). Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces. Applied Physics Letters, 98(24), 3. https://doi.org/10.1063/1.3601485 (Original work published 2011)

Profijt, H. B., Potts, S. E., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges. Journal of Vacuum Science & Technology A, 29(5), 26. https://doi.org/10.1116/1.3609974 (Original work published 2011)