M. C. M. van de Sanden

Law, F., Hoex, B., Wang, J., Luther, J., Sharma, K., Creatore, M., & van de Sanden, M. C. M. (2012). Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H. Thin Solid Films, 520(17), 5820-5825. https://doi.org/10.1016/j.tsf.2012.04.056 (Original work published 2012)

Premkumar, P. A., Starostin, S. A., de Vries, H., Creatore, M., Koenraad, P. M., MacDonald, W. A., & van de Sanden, M. C. M. (2012). Surface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure. Plasma Processes and Polymers, 9, 1194–1207. https://doi.org/10.1002/ppap.201200016

Bronneberg, A. C., Cankoy, N., van de Sanden, M. C. M., & Creatore, M. (2012). Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 30, 061512.

Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films. Electrochemical and Solid State Letters, 15(2), G1-G3. https://doi.org/10.1149/2.024202esl

van Harskamp, W. E. N., Brouwer, C. M., Schram, D. C., van de Sanden, M. C. M., & Engeln, R. (2012). Detailed H(n=2) density measurements in a magnetized hydrogen plasma jet. Plasma Sources Science & Technology, 21(2), 024009. https://doi.org/10.1088/0963-0252/21/2/024009 (Original work published 2012)

Beyene, H. T., Weber, J. W., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. (2012). Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2. Nano Research, 5(8), 513-520. https://doi.org/10.1007/s12274-012-0236-z (Original work published 2012)

Dingemans, G., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses. Plasma Processes and Polymers, 9(8), 761-771. https://doi.org/10.1002/ppap.201100196 (Original work published 2012)

Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide. Journal of Applied Physics, 112(4), 04370. https://doi.org/10.1063/1.4747942 (Original work published 2012)

Dingemans, G., Mandoc, M. M., Bordihn, S., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks. Applied Physics Letters, 98(22), 222102. https://doi.org/10.1063/1.3595940 (Original work published 2011)

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S., Roozeboom, F., … Kessels, W. M. M. (2011). Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma. Journal of Vacuum Science & Technology A, 29(2), 021016. https://doi.org/10.1116/1.3554691 (Original work published 2011)