DIFFER

M. C. M. van de Sanden

First name
M.
Middle name
C. M.
Last name
van de Sanden
ORCID
0000-0002-4119-9971
Sharma, K., Ponomarev, M. V., Verheijen, M. A., Kunz, O., Tichelaar, F. D., van de Sanden, M. C. M., & Creatore, M. (2012). Solid-phase crystallization of ultra high growth rate amorphous silicon films. Journal of Applied Physics, 111(10), 5. https://doi.org/10.1063/1.4717951 (Original work published 2012)
Dingemans, G., Einsele, F., Beyer, W., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface. Journal of Applied Physics, 111(9), 093713. https://doi.org/10.1063/1.4709729 (Original work published 2012)
Aresta, G., Palmans, J., van de Sanden, M. C. M., & Creatore, M. (2012). Initiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition. Journal of Vacuum Science & Technology A, 30(4), 11. https://doi.org/10.1116/1.4711762 (Original work published 2012)
Premkumar, P. A., Starostin, S. A., de Vries, H., Creatore, M., Koenraad, P. M., MacDonald, W. A., & van de Sanden, M. C. M. (2012). Surface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure. Plasma Processes and Polymers, 9, 1194–1207. https://doi.org/10.1002/ppap.201200016
Bronneberg, A. C., Cankoy, N., van de Sanden, M. C. M., & Creatore, M. (2012). Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 30, 061512.
Profijt, H. B., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films. Electrochemical and Solid State Letters, 15(2), G1-G3. https://doi.org/10.1149/2.024202esl
van Harskamp, W. E. N., Brouwer, C. M., Schram, D. C., van de Sanden, M. C. M., & Engeln, R. (2012). Detailed H(n=2) density measurements in a magnetized hydrogen plasma jet. Plasma Sources Science & Technology, 21(2), 024009. https://doi.org/10.1088/0963-0252/21/2/024009 (Original work published 2012)
Beyene, H. T., Weber, J. W., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. (2012). Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2. Nano Research, 5(8), 513-520. https://doi.org/10.1007/s12274-012-0236-z (Original work published 2012)
Dingemans, G., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses. Plasma Processes and Polymers, 9(8), 761-771. https://doi.org/10.1002/ppap.201100196 (Original work published 2012)
Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide. Journal of Applied Physics, 112(4), 04370. https://doi.org/10.1063/1.4747942 (Original work published 2012)