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Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012)
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2012
|
| Journal |
Journal of Applied Physics
|
| Volume |
112
|
| Number |
6
|
| Number of Pages |
1
|
| Date Published |
Sep
|
| Type of Article |
Correction
|
| ISBN Number |
0021-8979
|
| DOI | |
| PId |
82519ee32a0cd4930ad5df9b16fb3709
|
| Alternate Journal |
J. Appl. Phys.
|
Journal Article
|
|
| Download citation |