DIFFER
DIFFER Publication
Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012)
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2012
|
| Journal |
Journal of Applied Physics
|
| Volume |
112
|
| Number |
6
|
| Number of Pages |
1
|
| Date Published |
09/2012
|
| Type of Article |
Correction
|
| ISBN Number |
0021-8979
|
| DOI | |
| PId |
82519ee32a0cd4930ad5df9b16fb3709
|
| Alternate Journal |
J. Appl. Phys.
|
Journal Article
|
|
| Download citation |
Citation
Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012). Journal of Applied Physics, 112, 1. https://doi.org/10.1063/1.4747942 (Original work published 2012)