M. V. Ponomarev

Williams, B. L., Ponomarev, M. V., Verheijen, M. A., Knoops, H. C. M., Chandramohan, A., Duval, L., … Creatore, M. (2016). Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms. Plasma Processes and Polymers, 13(1), 54-69. https://doi.org/10.1002/ppap.201500179

Sharma, K., Ponomarev, M. V., van de Sanden, M. C. M., & Creatore, M. (2013). On the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon. Applied Physics Letters, 102, 212107. https://doi.org/10.1063/1.4809517

Sharma, K., Ponomarev, M. V., Verheijen, M. A., Kunz, O., Tichelaar, F. D., van de Sanden, M. C. M., & Creatore, M. (2012). Solid-phase crystallization of ultra high growth rate amorphous silicon films. Journal of Applied Physics, 111(10), 5. https://doi.org/10.1063/1.4717951 (Original work published 2025)

Ponomarev, M. V., Sharma, K., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. (2012). Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer. Journal of Applied Physics, 111(6), 063715. https://doi.org/10.1063/1.3692439 (Original work published 2025)

Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012). Journal of Applied Physics, 112, 1. https://doi.org/10.1063/1.4747942 (Original work published 2025)

Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M., & Creatore, M. (2012). Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide. Journal of Applied Physics, 112(4), 04370. https://doi.org/10.1063/1.4747942 (Original work published 2025)