DIFFER

M. C. M. van de Sanden

First name
M.
Middle name
C. M.
Last name
van de Sanden
ORCID
0000-0002-4119-9971
Minea, T., van den Bekerom, D. C. M., Peeters, F. J. J., Zoethout, E., Graswinckel, M. F., van de Sanden, M. C. M., … van Rooij, G. J. (2018). Non-oxidative methane coupling to C2 hydrocarbons in a microwave plasma reactor. Plasma Processes and Polymers, 15(11), 1800087. https://doi.org/10.1002/ppap.201800087
Diomede, P., van de Sanden, M. C. M., & Longo, S. (2018). Vibrational Kinetics in Plasma as a Functional Problem: a Flux-Matching Approach. Journal of Physical Chemistry A, 122(39), 7918–7923. https://doi.org/10.1021/acs.jpca.8b05623
Elam, F., Liu, Y., van der Velden-Schuermans, B. C. A. M., Starostin, S. A., van de Sanden, M. C. M., & de Vries, H. (2018). Visible detection of performance controlling pinholes in silica encapsulation. Journal of Physics D: Applied Physics, 51(43), 43LT01. https://doi.org/10.1088/1361-6463/aadf4a
van Eden, G. G., Reinke, M. L., Brons, S., van der Bijl, G., Krijger, B. J. M., Lavrijsen, R., … Morgan, T. W. (2018). Plasma radiation studies in Magnum-PSI using resistive bolometry. Nuclear Fusion, 58(10), 106006. https://doi.org/10.1088/1741-4326/aad0a9
Peeters, F. J. J., Zheng, J., Aarts, I. M. P., Pipino, A. C. R., Kessels, W. M. M., & van de Sanden, M. C. M. (2017). Atomic hydrogen induced defect kinetics in amorphous silicon. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35(5), 05C307. https://doi.org/10.1116/1.4987152 (Original work published 2017)
van den Bekerom, D. C. M., den Harder, N., Minea, T., Gatti, N., Palomares-Linares, J. M., Bongers, W. A., … van Rooij, G. J. (2017). Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry. Journal of Visualized Experiments, 2017(126), e55066. https://doi.org/10.3791/55066 (Original work published)
Bieberle, A., Tanyeli, I., Lavrijsen, R., Koopmans, B., Sinha, R., & van de Sanden, M. C. M. (2017). Nanostructuring of iron thin films by high flux low energy helium plasma. Thin Solid Films, 631, 50-56. https://doi.org/10.1016/j.tsf.2017.04.007 (Original work published 2017)
Elam, F. M., Starostin, S. A., Meshkova, A. S., van der Velden, B. C. A. M., van de Sanden, M. C. M., & de Vries, H. W. (2017). Defect prevention in silica thin films synthesized using AP-PECVD for flexible electronic encapsulation. Journal of Physics D: Applied Physics, 50(25), 25LT01. https://doi.org/10.1088/1361-6463/aa73f4
Adamovich, I., Baalrud, S. D., Bogaerts, A., Bruggeman, P. J., Cappelli, M., Colombo, V., … Vardelle, A. (2017). The 2017 Plasma Roadmap: Low temperature plasma science and technology. Journal of Physics D: Applied Physics, 50(32), 323001. https://doi.org/10.1088/1361-6463/aa76f5
Elam, F. M., Starostin, S. A., Meshkova, A. S., van der Velden-Schuermans, B. C. A. M., Bouwstra, J. B., van de Sanden, M. C. M., & de Vries, H. W. (2017). Atmospheric pressure roll-to-roll plasma enhanced CVD of high quality silica-like bilayer encapsulation films. Plasma Processes and Polymers, (7), 1600143. https://doi.org/10.1002/ppap.201600143