L. A. Shmaenok

Stuik, R., Shmaenok, L. A., Fledderus, H., Andreev, S. S., Shamov, E. A., . Y. Zuev, S., … Bijkerk, F. (1999). Development of low-energy x-ray fluorescence micro-distribution analysis using a laser plasma x-ray source and multilayer optics? Journal of Analytical Atomic Spectrometry, 14, 387-390. https://doi.org/10.1039/a807614f (Original work published 2025)

Shevelko, A. P., Shmaenok, L. A., Churilov, S. S., Bastiaensen, R., & Bijkerk, F. (1998). Extreme ultraviolet spectroscopy of a laser plasma source for lithography. Physica Scripta, 57, 276-282. https://doi.org/10.1088/0031-8949/57/2/023 (Original work published 2025)

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 2025)