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Bijkerk, F. ., Shmaenok, L. A., Louis, E. ., Voorma, H. J., Koster, N. B., Bruineman, C. ., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 2025)