C. Bruineman

Bijkerk, F., Alonso van der Westen, S., Bruineman, C., Huiting, R., de Bruijn, R., Stuik, R., & Bakshi, V. (2006). Flying Circus EUV Source Metrology and Source Development Assessment. In EUV Sources for Lithography (pp. 721-734). Bellingham: SPIE.

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 2025)