DIFFER
DIFFER Publication
Flying Circus EUV Source Metrology and Source Development Assessment
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2006
|
| Book Title |
EUV Sources for Lithography
|
| Chapter |
27
|
| Pagination |
721-734
|
| Publisher |
SPIE
|
| City |
Bellingham
|
| Publication Language |
eng
|
| ISBN Number |
0819458457
|
| PId |
f595eb07bce642daa6733f80ba54ee19
|
Book Chapter
|
|
| Download citation |
Citation
Bijkerk, F., Alonso van der Westen, S., Bruineman, C., Huiting, R., de Bruijn, R., Stuik, R., & Bakshi, V. (2006). Flying Circus EUV Source Metrology and Source Development Assessment. In EUV Sources for Lithography (pp. 721-734). Bellingham: SPIE.